Search results for "Hybrid multilayer"

showing 2 items of 2 documents

Polymer/metal hybrid multilayers modified Schottky devices

2013

Insulating, polymethylmethacrylate (PMMA), and semiconducting, poly(3-hexylthiophene) (P3HT), nanometer thick polymers/Au nanoparticles based hybrid multilayers (HyMLs) were fabricated on p-Si single-crystal substrate. An iterative method, which involves, respectively, spin-coating (PMMA and P3HT deposition) and sputtering (Au nanoparticles deposition) techniques to prepare Au/HyMLs/p-Si Schottky device, was used. The barrier height and the ideality factor of the Au/HyMLs/p-Si Schottky devices were investigated by current-voltage measurements in the thickness range of 1-5 bilayers. It was observed that the barrier height of such hybrid layered systems can be tuned as a function of bilayers …

Ideality factorMaterials sciencePhysics and Astronomy (miscellaneous)Layered systemNanoparticleSilicon GoldNanotechnologySingle-crystal substrates DepositionSubstrate (electronics)Poly-3-hexylthiopheneSettore ING-INF/01 - ElettronicaSettore FIS/03 - Fisica Della MateriaNanoparticleSputteringPolymer; Au nanoparticles; Schottky devicePolymerHybrid multilayerConductive polymerSpin coatingbusiness.industryBarrier heightSchottky diodeSputter depositionCurrent-voltage measurementSemiconducting siliconSchottky deviceOptoelectronicsSelf-assemblybusinessAu nanoparticles
researchProduct

Low-temperature atomic layer deposition of SiO2/Al2O3 multilayer structures constructed on self-standing films of cellulose nanofibrils

2018

In this paper, we have optimized a low-temperature atomic layer deposition (ALD) of SiO 2 using AP-LTO® 330 and ozone (O 3 ) as precursors, and demonstrated its suitability to surface-modify temperature-sensitive bio-based films of cellulose nanofibrils (CNFs). The lowest temperature for the thermal ALD process was 80°C when the silicon precursor residence time was increased by the stop-flow mode. The SiO 2 film deposition rate was dependent on the temperature varying within 1.5–2.2 Å cycle −1 in the temperature range of 80–350°C, respectively. The low-temperature SiO 2 process that resulted was combined with the conventional trimethyl aluminium + H 2 O process in order to prepare thin mul…

Water sensitivityMaterials scienceDiffusion barrierSiliconGeneral Mathematicsta221General Physics and Astronomychemistry.chemical_element02 engineering and technology01 natural sciencesOxygenAtomic layer depositionchemistry.chemical_compoundnanorakenteetHybrid multilayersSiO0103 physical sciencesCelluloseta216diffusion barrierta218low-temperature atomic layer depositionDiffusion barrierLow-temperature atomic layer deposition010302 applied physicsta214ta114water sensitivityta111General Engineeringcellulose nanofibrilsAtmospheric temperature range021001 nanoscience & nanotechnologyhybrid multilayerschemistryChemical engineeringCellulose nanofibrilsohutkalvotSiO20210 nano-technologyLayer (electronics)Water vaporPhilosophical Transactions of the Royal Society A : Mathematical Physical and Engineering Sciences
researchProduct